The effect of Ar/H2 plasma pretreatments on porous k=2.0 dielectrics for pore sealing by self-assembled monolayers deposition

Sun, YitingYitingSunSwerts, JohanJohanSwertsVerdonck, PatrickPatrickVerdonckMaheshwari, AbhishekAbhishekMaheshwariPrado, J.L.J.L.PradoDe Feyter, StevenStevenDe FeyterArmini, SilviaSilviaArmini2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23139The effect of Ar/H2 plasma pretreatments on porous k=2.0 dielectrics for pore sealing by self-assembled monolayers depositionProceedings paperhttp://www.scientific.net/SSP.195.146