Influence of doping profile and halo implantation on the threshold voltage mismatch of a 0.13μm CMOS technology

Croon, JeroenJeroenCroonAugendre, EmmanuelEmmanuelAugendreDecoutere, StefaanStefaanDecoutereSansen, WillyWillySansenMaes, HermanHermanMaes2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6155Influence of doping profile and halo implantation on the threshold voltage mismatch of a 0.13μm CMOS technologyProceedings paper