Godavarthi, SrinivasSrinivasGodavarthiWang, CongCongWangVerdonck, PatrickPatrickVerdonckMatsumoto, YasuhiroYasuhiroMatsumotoKoudriavtsev, IIKoudriavtsevTielens, HildeHildeTielensBaklanov, MikhaïlMikhaïlBaklanov2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20725Study of porogen removal by HWCVD for the fabrication of advanced low-k filmsMeeting abstract