Chemical vapour deposition of Si:C and Si:C:P films – evaluation of material quality as a function of C content, carrier gas and doping

Dhayalan, Sathish KumarSathish KumarDhayalanLoo, RogerRogerLooHikavyy, AndriyAndriyHikavyyRosseel, ErikErikRosseelBender, HugoHugoBenderRichard, OlivierOlivierRichardVandervorst, WilfriedWilfriedVandervorst2021-10-222021-10-2220150022-0248https://imec-publications.be/handle/20.500.12860/25210Chemical vapour deposition of Si:C and Si:C:P films – evaluation of material quality as a function of C content, carrier gas and dopingJournal articlehttp://www.sciencedirect.com/science/article/pii/S0022024815003826