Source/drain materials for Ge nMOS devices

Vohra, AnuragAnuragVohraPorret, ClémentClémentPorretRosseel, ErikErikRosseelHikavyy, AndriyAndriyHikavyyCapogreco, ElenaElenaCapogrecoHoriguchi, NaotoNaotoHoriguchiLoo, RogerRogerLooVandervorst, WilfriedWilfriedVandervorst2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34403Source/drain materials for Ge nMOS devicesMeeting abstract