Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors

Peter, AntonyAntonyPeterToeller, MichaelMichaelToellerRadu, IulianaIulianaRaduAdelmann, ChristophChristophAdelmannSchaekers, MarcMarcSchaekersMeersschaut, JohanJohanMeersschautConard, ThierryThierryConardVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-2020122162-8769https://imec-publications.be/handle/20.500.12860/21286Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursorsJournal article