Hoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-182021-10-182010-030038-111Xhttps://imec-publications.be/handle/20.500.12860/17268Integrating high-k /metal gates: gate-first or gate-last?Journal articlehttp://www.electroiq.com/index/display/semiconductors-article-display/2809542897/articles/solid-state-technology/volume-53/issue