Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring

Halder, SandipSandipHalderMols, YvesYvesMolsVan Den Heuvel, DieterDieterVan Den HeuvelVan Puymbroeck, JanJanVan PuymbroeckCaymax, MattyMattyCaymaxVancoille, EricEricVancoilleNieuborg, NancyNancyNieuborgBast, GerhardGerhardBastSimpson, GavinGavinSimpsonPeikert, MilkoMilkoPeikertPolli, MarcoMarcoPolliUlea, NeliNeliUleaSeong, Ho YooHo YooSeong2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23901Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoringProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6847022&contentType=Conference+Publications