Kim, DongchanDongchanKimUrbanowicz, AdamAdamUrbanowiczMannaert, GeertGeertMannaertStruyf, HerbertHerbertStruyfMin, K. J.K. J.MinKang, C. J.C. J.KangMoon, J. T.J. T.MoonBaklanov, MikhaïlMikhaïlBaklanov2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12398Effects of plasma chemistry on low-k film propertiesProceedings paper