Saifullah, Mohammad S. M.Mohammad S. M.SaifullahAsbahi, MohamedMohamedAsbahiNeo, Darren C. J.Darren C. J.NeoMahfoud, ZackariaZackariaMahfoudTan, Hui RuHui RuTanHa, Son TungSon TungHaDwivedi, NeerajNeerajDwivediDutta, TanmayTanmayDuttabin Dolmanan, SuraniSuranibin DolmananAabdin, ZainulZainulAabdinBosman, MichelMichelBosmanGanesan, RamakrishnanRamakrishnanGanesanTripathy, SudhiranjanSudhiranjanTripathyHasko, David G.David G.HaskoValiyaveettil, SureshSureshValiyaveettil2022-11-102022-09-232022-11-1020221530-6984WOS:000853781600001https://imec-publications.be/handle/20.500.12860/40487Patterning at the Resolution Limit of Commercial Electron Beam LithographyJournal article10.1021/acs.nanolett.2c02339WOS:000853781600001KNIFE-EDGECDSDIAMETERPHOTOLUMINESCENCEFLUORESCENCECLUSTERSMEDLINE:36069429