Unveiling surface reactivity: the crucial role of auxiliary ligands in gallium amidinate-based precursors for atomic layer deposition

Pugliese, EvaEvaPuglieseCoutancier, DamienDamienCoutancierPavard, Paul-AlexisPaul-AlexisPavardHervochon, JulienJulienHervochonvan der Linden, BramBramvan der LindenCasaretto, NicolasNicolasCasarettoBourcier, SophieSophieBourcierPourtois, GeoffreyGeoffreyPourtoisBouttemy, MurielMurielBouttemyAuffrant, AudreyAudreyAuffrantSchneider, NathanaelleNathanaelleSchneider2025-03-182025-03-102025-03-1820251477-9226WOS:001435786300001https://imec-publications.be/handle/20.500.12860/45374Unveiling surface reactivity: the crucial role of auxiliary ligands in gallium amidinate-based precursors for atomic layer depositionJournal article10.1039/d4dt03498hWOS:001435786300001ChemistryALDH2OH2SDFTSynthesisGa2O3 filmsGa2S3 filmsGallium amidinate precursorsOxide thin filmsMEDLINE:40028889