Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition

Nye, RachelRachelNyeVan Dongen, KaatKaatVan DongenDe Simone, DaniloDaniloDe SimoneOKa, HironoriHironoriOKaParsons, Gregory N.Gregory N.ParsonsDelabie, AnneliesAnneliesDelabie2023-07-242023-03-202023-07-2420230897-4756WOS:000937018300001https://imec-publications.be/handle/20.500.12860/41315Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective DepositionJournal article10.1021/acs.chemmater.2c03404WOS:000937018300001ATOMIC LAYER DEPOSITIONPOLY(METHYL METHACRYLATE)TITANIUM-DIOXIDESURFACETIO2ALDTRIMETHYLALUMINUMPASSIVATIONMECHANISMSGROWTH