Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

Adelmann, ChristophChristophAdelmannCuypers, DanielDanielCuypersTallarida, MassimoMassimoTallaridaRodriguez, LeonardLeonardRodriguezDe Clercq, AstridAstridDe ClercqFriedrich, DanielDanielFriedrichConard, ThierryThierryConardDelabie, AnneliesAnneliesDelabieSeo, Jin WonJin WonSeoLocquet, Jean-PierreJean-PierreLocquetDe Gendt, StefanStefanDe GendtSchmeisser, DieterDieterSchmeisserVan Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymax2021-10-212021-10-2120130897-4756https://imec-publications.be/handle/20.500.12860/21950Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphideJournal article10.1021/cm304070h