In situ interface and surface characterization of Ge passivated III-V substrates for high-k oxide deposition

Molle, AlessandroAlessandroMolleSpiga, SabinaSabinaSpigaFanciulli, MarcoMarcoFanciulliBrammertz, GuyGuyBrammertzMeuris, MarcMarcMeuris2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14184In situ interface and surface characterization of Ge passivated III-V substrates for high-k oxide depositionProceedings paper