Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Wood, ObertObertWoodRaghunathan, SudharSudharRaghunathanMangat, PawitterPawitterMangatPhilipsen, VickyVickyPhilipsenLuong, VuVuLuongKearney, PatrickPatrickKearneyVerduijn, ErikErikVerduijnKumar, AdityaAdityaKumarPatil, SurajSurajPatilLaubis, ChristianChristianLaubisSoltwisch, VictorVictorSoltwischScholze, FrankFrankScholze2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26184Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacksProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2208395