Tsvetanova, DianaDianaTsvetanovaVos, RitaRitaVosVanstreels, KrisKrisVanstreelsRadisic, DunjaDunjaRadisicSonnemans, RogerRogerSonnemansBerry, IvanIvanBerryWaldfried, CarloCarloWaldfriedMattson, DavidDavidMattsonDeLuca, JamesJamesDeLucaVereecke, GuyGuyVereeckeMertens, PaulPaulMertensParac-Vogt, TatjanaTatjanaParac-VogtHeyns, MarcMarcHeyns2021-10-192021-10-1920110013-4651https://imec-publications.be/handle/20.500.12860/19922Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solventJournal article