Estroff, AndrewAndrewEstroffBailey, GeorgeGeorgeBaileyKostas, AdamAdamKostasVandenberghe, GeertGeertVandenbergheHendrickx, EricEricHendrickx2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10437Validation of immersion lithography OPC model accuracyProceedings paper