Van Elshocht, SvenSvenVan ElshochtBaklanov, MikhaïlMikhaïlBaklanovBrijs, BertBertBrijsCarter, R.R.CarterCaymax, MattyMattyCaymaxCarbonell, LaureLaureCarbonellClaes, MartineMartineClaesConard, ThierryThierryConardCosnier, VincentVincentCosnierDate, LucienLucienDateDe Gendt, StefanStefanDe GendtKluth, J.J.KluthPique, DidierDidierPiqueRichard, OlivierOlivierRichardVanhaeren, DanielleDanielleVanhaerenVereecke, GuyGuyVereeckeWitters, ThomasThomasWittersZhao, ChaoChaoZhaoHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9741Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applicationsJournal article