Thermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devices

Veloso, AnabelaAnabelaVelosoArimura, HiroakiHiroakiArimuraSimoen, EddyEddySimoenParaschiv, VasileVasileParaschivShi, XiaopingXiaopingShiCho, Moon JuMoon JuChoRagnarsson, Lars-AkeLars-AkeRagnarssonChew, Soon AikSoon AikChewVecchio, EmmaEmmaVecchioSebaai, FaridFaridSebaaiRoussel, PhilippePhilippeRousselSantos, S. D.S. D.SantosSchram, TomTomSchramHiguchi, Y.Y.HiguchiThean, AaronAaronTheanHoriguchi, NaotoNaotoHoriguchi2021-10-202021-10-202012-12https://imec-publications.be/handle/20.500.12860/21763Thermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devicesMeeting abstract