Yasui, NaokiNaokiYasuiIsawa, MikiMikiIsawaIshimoto, ToruToruIshimotoSekiguchi, KoheiKoheiSekiguchiTanaka, MakiMakiTanakaOsaki, MayukaMayukaOsakiShishido, ChieChieShishidoHasegawa, NorioNorioHasegawaCheng, ShauneeShauneeCheng2021-10-192021-10-192010https://imec-publications.be/handle/20.500.12860/18383Application of model-based library approach to photoresist pattern shape measurement in advenced lithographyProceedings paper