A Novel Main Chain Scission Type Photoresists for EUV Lithography

Shirotori, A.A.ShirotoriHoshino, M.M.HoshinoDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenbergheMatsumoto, H.H.Matsumoto2021-12-102021-11-022021-12-1020200277-786XWOS:000632585900006https://imec-publications.be/handle/20.500.12860/38082A Novel Main Chain Scission Type Photoresists for EUV LithographyProceedings paper10.1117/12.2572582978-1-5106-3843-3WOS:000632585900006