Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

Abell, ThomasThomasAbellSchuhmacher, JorgJorgSchuhmacherTokei, ZsoltZsoltTokeiTravaly, YoussefYoussefTravalyMaex, KarenKarenMaex2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/9993Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closureJournal article