Resist process development for the EUV alpha demo tool at IMEC

Goethals, MiekeMiekeGoethalsNiroomand, ArdavanArdavanNiroomandVan Roey, FriedaFriedaVan RoeyHermans, JanJanHermansLorusso, GianGianLorussoBaudemprez, BartBartBaudemprezPollentier, IvanIvanPollentierde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDemuynck, StevenStevenDemuynckJonckheere, RikRikJonckheereRonse, KurtKurtRonse2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13778Resist process development for the EUV alpha demo tool at IMECOral presentation