Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICs

Vandenberghe, GeertGeertVandenbergheDriessen, FrankFrankDriessenVan Adrichem, PaulPaulVan AdrichemRonse, KurtKurtRonse2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5765Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICsOral presentation