Hikavyy, AndriyAndriyHikavyyPorret, ClémentClémentPorretRosseel, ErikErikRosseelLoo, RogerRogerLoo2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30896Application of Cl2 for low temperature etch and epitaxyMeeting abstract