Satta, AlessandraAlessandraSattaSchuhmacher, JörgJörgSchuhmacherWhelan, CarolineCarolineWhelanVandervorst, WilfriedWilfriedVandervorstBrongersma, SywertSywertBrongersmaBeyer, GeraldGeraldBeyerMaex, KarenKarenMaexVantomme, AndreAndreVantommeViitanen, M.M.M.M.ViitanenBrongersma, H.H.H.H.BrongersmaBesling, WimWimBesling2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6792Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2Journal article