Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

Togo, MitsuhiroMitsuhiroTogoSasaki, YuichiroYuichiroSasakiZschaetzsch, GerdGerdZschaetzschBoccardi, GuillaumeGuillaumeBoccardiRitzenthaler, RomainRomainRitzenthalerLee, Jae WooJae WooLeeKhaja, FareenFareenKhajaColombeau, BenjaminBenjaminColombeauGodet, LudovicLudovicGodetMartin, PatrickPatrickMartinBrus, StephanStephanBrusAltamirano Sanchez, EfrainEfrainAltamirano SanchezMannaert, GeertGeertMannaertDekkers, HaroldHaroldDekkersHellings, GeertGeertHellingsHoriguchi, NaotoNaotoHoriguchiVandervorst, WilfriedWilfriedVandervorstThean, AaronAaronThean2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23172Heated implantation with amorphous carbon CMOS mask for scaled FinFETsProceedings paperhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6576650&tag=1