Optimal frequency range selection for full C-V characterization above 45MHz for ultra thin (1.2-nm) nitrided oxide MOSFETs

Jeamsaksiri, WutthinanWutthinanJeamsaksiriMercha, AbdelkarimAbdelkarimMerchaRamos, JavierJavierRamosDecoutere, StefaanStefaanDecoutereCubaynes, FlorenceFlorenceCubaynes2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9094Optimal frequency range selection for full C-V characterization above 45MHz for ultra thin (1.2-nm) nitrided oxide MOSFETsProceedings paper