Zhao, ChaoChaoZhaoRichard, OlivierOlivierRichardBender, HugoHugoBenderHoussa, MichelMichelHoussaCarter, RichardRichardCarterDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsYoung, EdwardEdwardYoungTsai, WilmanWilmanTsaiRoebben, G.G.RoebbenVan der Biest, O.O.Van der BiestHaukka, S.S.Haukka2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5876Crystallization behaviour of ZrO2/Al2O3-based high-k gate stacksOral presentation