Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning

Hasan, MahmudulMahmudulHasanBeral, ChristopheChristopheBeralLorusso, GianGianLorussoDe Simone, DaniloDaniloDe SimoneMoussa, AlainAlainMoussaVan den Heuvel, DieterDieterVan den HeuvelCharley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLeray2023-06-052023-03-222023-06-0520220277-786XWOS:000944102600021https://imec-publications.be/handle/20.500.12860/41328Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterningProceedings paper10.1117/12.2641768978-1-5106-5640-6WOS:000944102600021