Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics

Krishtab, MikhailMikhailKrishtabVanstreels, KrisKrisVanstreelsBaklanov, MikhaïlMikhaïlBaklanovDe Gendt, StefanStefanDe Gendt2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25491Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectricsProceedings paperhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7325642