Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node

Decoster, StefanStefanDecosterPaolillo, SaraSaraPaolilloKesters, ElsElsKestersBriggs, BasoeneBasoeneBriggsvan der Veen, MarleenMarleenvan der VeenLazzarino, FredericFredericLazzarinoPiumi, DanieleDanielePiumiYamashita, FumikoFumikoYamashitaDemand, MarcMarcDemandKumar, KaushikKaushikKumar2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26525Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology nodeMeeting abstract