Vandeweyer, TomTomVandeweyerMaenhoudt, MireilleMireilleMaenhoudtVangoidsenhoven, DizianaDizianaVangoidsenhovenGronheid, RoelRoelGronheidVersluijs, JankoJankoVersluijsMiller, AndyAndyMillerBekaert, JoostJoostBekaertTruffert, VincentVincentTruffertWiaux, VincentVincentWiaux2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16436Advanced optical lithography: double patterning options for 32 and 22nm nodeOral presentation