Ruzyllo, JerzyJerzyRuzylloRöhr, ErikaErikaRöhrBaeyens, MartienMartienBaeyensBearda, TwanTwanBeardaMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3786Gas-phase surface proessing prior to 3.2nm gate oxidationProceedings paper