Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV

Hermans, YannickYannickHermansDecoster, StefanStefanDecosterWu, ChenChenWuDoise, JanJanDoiseRenaud, VincentVincentRenaudVan den Heuvel, DieterDieterVan den HeuvelPark, SeonghoSeonghoParkRincon Delgadillo, PaulinaPaulinaRincon DelgadilloTokei, ZsoltZsoltTokei2025-06-172025-05-112025-06-172024978-1-5106-8155-20277-786XWOS:001467876500026https://imec-publications.be/handle/20.500.12860/45650Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUVProceedings paper10.1117/12.3034200978-1-5106-8156-9WOS:001467876500026