Use of positive and negative chemically amplified resists in electron-beam direct-write lithography

Tritchkov, AlexanderAlexanderTritchkovJonckheere, RikRikJonckheereVan den hove, LucLucVan den hove2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/919Use of positive and negative chemically amplified resists in electron-beam direct-write lithographyJournal article