Development, optimization and evaluation of a CF4 pre-treatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applications

Bryce, GeorgeGeorgeBryceSeveri, SimoneSimoneSeveriVan Hoof, RitaRitaVan HoofGuo, BinBinGuoKunnen, EddyEddyKunnenWitvrouw, AnnAnnWitvrouwDecoutere, StefaanStefaanDecoutere2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/16811Development, optimization and evaluation of a CF4 pre-treatment process to remove unwanted interfacial layers in stacks of CVD and PECVD polycrystalline silicon-germanium for MEMS applicationsMeeting abstract