Osaki, MayukaMayukaOsakiTanaka, MakiMakiTanakaShishido, ChieChieShishidoIshimoto, ToruToruIshimotoHasegawa, NorioNorioHasegawaSekiguchi, KoheiKoheiSekiguchiWatanabe, KenjiKenjiWatanabeCheng, ShauneeShauneeChengLaidler, DavidDavidLaidlerErcken, MoniqueMoniqueErckenAltamirano Sanchez, EfrainEfrainAltamirano Sanchez2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14257Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithographyProceedings paper