Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate

Claes, MartineMartineClaesParaschiv, VasileVasileParaschivBeckx, StephanStephanBeckxDemand, MarcMarcDemandDeweerd, WimWimDeweerdGaraud, SylvainSylvainGaraudKraus, HaraldHaraldKrausVos, RitaRitaVosSnow, JimJimSnowBoullart, WernerWernerBoullartDe Gendt, StefanStefanDe Gendt2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8688Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gateOral presentation