Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation

Vermang, BartBartVermangRothschild, AudeAudeRothschildJohn, JoachimJoachimJohnPoortmans, JefJefPoortmansMertens, RobertRobertMertens2021-10-192021-10-1920111062-7995https://imec-publications.be/handle/20.500.12860/20075Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivationJournal articlehttp://onlinelibrary.wiley.com/doi/10.1002/pip.1092/pdf