Detavernier, C.C.DetavernierVan Meirhaeghe, R.R.Van MeirhaegheMaex, KarenKarenMaex2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5247CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleationOral presentation