Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Lucas, KevinKevinLucasCork, Christopher M.Christopher M.CorkMiloslavsky, AlexanderAlexanderMiloslavskyLuk-Pat, GerardGerardLuk-PatBarnes, Levi D.Levi D.BarnesHapli, JohnJohnHapliLewellen, JohnJohnLewellenRollins, GregoyGregoyRollinsWiaux, VincentVincentWiauxVerhaegen, StafStafVerhaegen2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15763Double-patterning interactions with wafer processing, optical proximity correction, and physical design flowsJournal article