Verstraete, LanderLanderVerstraeteSuh, Hyo SeonHyo SeonSuhVan Bel, JulieJulieVan BelBak, Byeong-UByeong-UBakKim, Seong EunSeong EunKimVallat, RemiRemiVallatBezard, PhilippePhilippeBezardBeggiato, MatteoMatteoBeggiatoBeral, ChristopheChristopheBeral2024-08-272024-06-062024-08-272024978-1-5106-7218-50277-786XWOS:001222851800013https://imec-publications.be/handle/20.500.12860/43992Material and process optimization for EUV pattern rectification by DSAProceedings paper10.1117/12.3010817978-1-5106-7219-2WOS:001222851800013