Built-in self-limitation of masked aluminum anodization using photoresist

Zekry, JosephJosephZekryCelis, Jean-PierreJean-PierreCelisSabuncuoglu Tezcan, DenizDenizSabuncuoglu TezcanPuers, BobBobPuersVan Hoof, ChrisChrisVan HoofTilmans, HarrieHarrieTilmans2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20192Built-in self-limitation of masked aluminum anodization using photoresistProceedings paper