Vos, RitaRitaVosKesters, ElsElsKestersGaraud, SylvainSylvainGaraudDe Waele, RitaRitaDe WaeleKenis, KarineKarineKenisLux, MarcelMarcelLuxKraus, HaraldHaraldKrausSnow, JimJimSnowShamiryan, DenisDenisShamiryanCatana, GabrielaGabrielaCatanaDeweerd, WimWimDeweerdSchram, TomTomSchramDe Gendt, StefanStefanDe GendtMertens, PaulPaulMertens2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11527Wafer backside cleaning strategies for high-k/metal gate processingProceedings paper