Sidewall damage in silica-based low-k material induced by different patterning plasma processes studied by energy filtered and analytical scanning TEM

Richard, OlivierOlivierRichardIacopi, FrancescaFrancescaIacopiBender, HugoHugoBenderBeyer, GeraldGeraldBeyer2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12776Sidewall damage in silica-based low-k material induced by different patterning plasma processes studied by energy filtered and analytical scanning TEMJournal article