Vos, IngridIngridVosHellin, DavidDavidHellinBoullart, WernerWernerBoullartVertommen, JohanJohanVertommen2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/20118Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacksJournal article