Alternative process schemes for double patterning that eliminate the intermediate etch step

Maenhoudt, MireilleMireilleMaenhoudtGronheid, RoelRoelGronheidStepanenko, NickolayNickolayStepanenkoMatsuda, TakashiTakashiMatsudaVangoidsenhoven, DizianaDizianaVangoidsenhoven2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14086Alternative process schemes for double patterning that eliminate the intermediate etch stepProceedings paper