Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation

Vermang, BartBartVermangLorenz, AnneAnneLorenzRothschild, AudeAudeRothschildJohn, JoachimJoachimJohnPoortmans, JefJefPoortmansMertens, RobertRobertMertens2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20074Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivationProceedings paper