Characterization of post-etched photoresist and residues by various analytical techniques

Franquet, AlexisAlexisFranquetClaes, MartineMartineClaesConard, ThierryThierryConardKesters, ElsElsKestersVereecke, GuyGuyVereeckeVandervorst, WilfriedWilfriedVandervorst2021-10-162021-10-162007-11https://imec-publications.be/handle/20.500.12860/12170Characterization of post-etched photoresist and residues by various analytical techniquesMeeting abstract